Otto Zhou Research Lab

Department of Physics & Astronomy

The University of North Carolina at Chapel Hill

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Zhou group awarded funding as part of NCI grant (more)

Facilities – Film Deposition

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Learn more about: David Lalush, NCSU BME JP Lu, UNC Physics Kay Lund, UNC Medicine Etta Pisano, UNC Radiology Xintek

Journals

Choose a journal: Advanced Materials Applied Physics Letters Chemical Physics Letters Medical Physics Molecular Imaging Nano Letters Nature Physics in Med. and Bio. Radiology Rev. of Scientific Instruments Science

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Visit our sponsors: AFOSR- Air Force NASA NCBC- NC Biotech National Cancer Institute NIBIB- Biomedical Imaging National Science Foundation Office of Naval Research

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Get involved: American Insititute of Physics Americal Physical Society Materials Research Society

Sputtering system	Thermal evaporator
Reactive ion etching system	Lamellar flow dust free hood
Wet etching	Electrophoretic deposition system

Name: Kurt J. Lesker Company PVD 75

Application: The Kurt J. Lesker Company PVD 75 is a versatile R&D system which can be configured to suit a variety of thin film deposition applications. The multi-technique features include sputtering, electron beam evaporation, thermal evaporation and Evaporation Furnaces (LTE Sources).

Name: Samco RIE System, Model RIE-1C

Application: This high-performance system is engineered to optimize etching rates, uniformity and selectivity and is especially well suited for removing passivation materials for failure analysis. The RIE-1C can also be used for etching silicon based films, as well as refractory metals, metal silicides and spin-on-glass. Applications include Stripping of passivation materials including silicon nitride, silicon dioxide and silicon oxynitride, etching of intermetal dielectric with profile control, removal of residual encapsulation materials on ICs for failure analysis, stripping of photoresist and polyimide, etching silicon, polysilicon, refractory metals, metal silicides, spin-on-glass, etc.